| Equipment(设备) | 详情 | 
|---|---|
| ALD | ALDER - 1000 | 
| Capacity(能力) | 
			Up to 45 φ300 wafers per batch (≥ 5hour per batch) 每批最多 45 φ300 个晶片(每批 ≥ 5 小时)  | 
	
| Product Characteristics(产品特性) | 详情 | 
| Substarte Material(材料) | 
			Resin - based, glass - based, silicone - based substrate 树脂基、玻璃基、硅基  | 
	
| Product Type(产品类型) | 
			Various types of flat and aspherical mirror coating; wafer coating (within 12"); Shaped structure coating 各类平片、非球面镜镀膜;晶圆镀膜(12“以内);异形结构镀膜  | 
	
| Coating material(镀膜材料) | SiO₂, TiO₂, Al₂O₃ | 
| Optical properties(光学特性) | 详情 | 
| Wavelength(工作波段) | 420 - 700nm | 
| Reflectivity(420 - 700nm)(反射(420 - 700nm)) | Rmax<0.1% | 
| Wide - angle(0°~40°)(大角度(0°~40°)) | Rmax<0.5% | 
| Appearance(外观规格) | 详情 | 
| Appearance(外观水平) | 
			Surface Particle:1.0~10um 表面 Particle:1.0~10um  |